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dc.contributor.author陳昱良en_US
dc.contributor.author錢乃瑛en_US
dc.contributor.author裘性天en_US
dc.contributor.author李紫原en_US
dc.date.accessioned2014-12-16T06:16:29Z-
dc.date.available2014-12-16T06:16:29Z-
dc.date.issued2014-10-21en_US
dc.identifier.govdocC25D005/02zh_TW
dc.identifier.govdocC23C014/16zh_TW
dc.identifier.govdocC23C014/34zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/105916-
dc.description.abstract本發明提供一種一維金屬奈米結構之製造方法,係利用濺鍍方式濺鍍一層導電薄膜於一撓性基材上,以形成一導電基材;再將導電基材放置於電鍍溶液內進行電化學沈積,使導電基材上形成對應導電薄膜之一維金屬奈米線結構。因此,本發明的材料製作不需要複雜的微影蝕刻技術流程、及金屬奈米結構粉末混漿塗膜於基材上,即可得到具有高表面積的一維金屬奈米線線結構於撓性基材上。zh_TW
dc.language.isozh_TWen_US
dc.title一維金屬奈米結構之製造方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI457474zh_TW
Appears in Collections:Patents


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