Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 盧廷昌 | en_US |
| dc.contributor.author | 陳瓊華 | en_US |
| dc.date.accessioned | 2014-12-16T06:16:47Z | - |
| dc.date.available | 2014-12-16T06:16:47Z | - |
| dc.date.issued | 2011-08-21 | en_US |
| dc.identifier.govdoc | H01S005/30 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/106079 | - |
| dc.description.abstract | 一種邊射型高功率雷射二極體結構，其係具有啁啾(chirp)型周期性分佈之複數模態延展子層，其近場光型會呈現L形，且光場強度高的部分與多重量子井重疊良好，因此可獲得良好的光侷限因子，而且，光場強度低的部分會盡量往n型披覆層延伸，如此可降低邊射型高功率雷射二極體鏡面的光功率密度，並降低垂直發散角，增加此邊射型高功率雷射二極體的壽命。 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 邊射型高功率雷射二極體結構 | zh_TW |
| dc.type | Patents | en_US |
| dc.citation.patentcountry | TWN | zh_TW |
| dc.citation.patentnumber | I347717 | zh_TW |
| Appears in Collections: | Patents | |
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