High-coercivity CoPt alloy films grown by sputtering

doi:10.1109/20.539310

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Hu, JP	en_US
dc.contributor.author	Lin, P	en_US
dc.date.accessioned	2014-12-08T15:02:23Z	-
dc.date.available	2014-12-08T15:02:23Z	-
dc.date.issued	1996-09-01	en_US
dc.identifier.issn	0018-9464	en_US
dc.identifier.uri	http://dx.doi.org/10.1109/20.539310	en_US
dc.identifier.uri	http://hdl.handle.net/11536/1062	-
dc.description.abstract	CoXPt1-X alloy films (x=0.2 similar to 0.4) were prepared by rf sputtering at substrate temperatures 150 similar to 300 degrees C without Pt underlayer and post annealing. The magnetic properties of the films showed strong dependence on the composition and substrate temperature. High coerivity (similar to 191 KA/m) and saturated remanence were achieved st conditions x=0.25 and 200 degrees C. In contrast to the previous observations, the high perpendicular magnetic anisotropy, is tbe current case, appealed aot associated with the good CoPt (111) texture. Au interpretation based on minor composition modulation is the films was proposed.	en_US
dc.language.iso	en_US	en_US
dc.title	High-coercivity CoPt alloy films grown by sputtering	en_US
dc.type	Article; Proceedings Paper	en_US
dc.identifier.doi	10.1109/20.539310	en_US
dc.identifier.journal	IEEE TRANSACTIONS ON MAGNETICS	en_US
dc.citation.volume	32	en_US
dc.citation.issue	5	en_US
dc.citation.spage	4096	en_US
dc.citation.epage	4098	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	材料科學與工程學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Materials Science and Engineering	en_US
dc.identifier.wosnumber	WOS:A1996VM25800238	-
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