Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 裘性天 | en_US |
dc.contributor.author | 李紫原 | en_US |
dc.contributor.author | 王隆昇 | en_US |
dc.contributor.author | 盛焙蓀 | en_US |
dc.date.accessioned | 2014-12-16T06:17:17Z | - |
dc.date.available | 2014-12-16T06:17:17Z | - |
dc.date.issued | 2006-05-01 | en_US |
dc.identifier.govdoc | C01B006/04 | zh_TW |
dc.identifier.govdoc | B05D003/00 | zh_TW |
dc.identifier.govdoc | C01B006/04 | zh_TW |
dc.identifier.govdoc | B05D003/00 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/106337 | - |
dc.description.abstract | 一種在一不干擾反應的惰性氣體氛圍下,將反應物A均勻塗佈於具特殊形貌的模板T上,以使形成一製備奈米材料用之具有反應物A的模板TA,於反應器中不干擾反應的惰性氣體氛圍下,使模板TA之反應物A與反應物B起反應,以製備一具有生成物C的反應性模板TC;以及於不干擾反應的惰性氣體氛圍下,使用該反應性模板,利用溶劑將具有生成物C的反應性模板TC中之模板T予以移除,使形成奈米材料之製備方法,及所製得的具有與模板T相同之特殊形貌的奈米材料。 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 反應性模板之製備方法、奈米材料之製備方法及奈米材料 | zh_TW |
dc.type | Patents | en_US |
dc.citation.patentcountry | TWN | zh_TW |
dc.citation.patentnumber | I254030 | zh_TW |
Appears in Collections: | Patents |
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