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dc.contributor.author裘性天en_US
dc.contributor.author李紫原en_US
dc.contributor.author王隆昇en_US
dc.contributor.author盛焙蓀en_US
dc.date.accessioned2014-12-16T06:17:17Z-
dc.date.available2014-12-16T06:17:17Z-
dc.date.issued2006-05-01en_US
dc.identifier.govdocC01B006/04zh_TW
dc.identifier.govdocB05D003/00zh_TW
dc.identifier.govdocC01B006/04zh_TW
dc.identifier.govdocB05D003/00zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/106337-
dc.description.abstract一種在一不干擾反應的惰性氣體氛圍下,將反應物A均勻塗佈於具特殊形貌的模板T上,以使形成一製備奈米材料用之具有反應物A的模板TA,於反應器中不干擾反應的惰性氣體氛圍下,使模板TA之反應物A與反應物B起反應,以製備一具有生成物C的反應性模板TC;以及於不干擾反應的惰性氣體氛圍下,使用該反應性模板,利用溶劑將具有生成物C的反應性模板TC中之模板T予以移除,使形成奈米材料之製備方法,及所製得的具有與模板T相同之特殊形貌的奈米材料。zh_TW
dc.language.isozh_TWen_US
dc.title反應性模板之製備方法、奈米材料之製備方法及奈米材料zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI254030zh_TW
Appears in Collections:Patents


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