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dc.contributor.author黃中垚en_US
dc.contributor.author李建立en_US
dc.date.accessioned2014-12-16T06:17:20Z-
dc.date.available2014-12-16T06:17:20Z-
dc.date.issued2005-05-11en_US
dc.identifier.govdocG01N021/17zh_TW
dc.identifier.govdocG01B011/06zh_TW
dc.identifier.govdocG01N021/17zh_TW
dc.identifier.govdocG01B011/06zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/106389-
dc.description.abstract本發明提供一種可同時量測光學晶體厚度及光軸之影像式光學量測方法,其係利用同一偏光儀架構先進行析光片旋轉量測,以透過析光片連續變化之不同方位角來取得相對應之一系列的光強度變化影像,並將該等影像擬合以得到晶體薄膜之光軸投影在薄膜平面之投影光軸指向,接著再進行樣品旋轉量測,以連續調整偏極光對於薄膜之入射角,進而測得薄膜光軸在三維空間的指向和厚度之二維分佈。因此本發明在僅使用一量測架構之前提下,可同時測得光學晶體之厚度及其光軸指向,並可達成降低量測成本、經濟、量測方便及測值精確等功效。zh_TW
dc.language.isozh_TWen_US
dc.title可同時量測光學晶體厚度及光軸之影像式偏極光量測方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumberI232294zh_TW
Appears in Collections:Patents


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