Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 李承士 | en_US |
| dc.contributor.author | 張翼 | en_US |
| dc.date.accessioned | 2014-12-16T06:17:31Z | - |
| dc.date.available | 2014-12-16T06:17:31Z | - |
| dc.date.issued | 2003-04-11 | en_US |
| dc.identifier.govdoc | H01L023/544 | zh_TW |
| dc.identifier.govdoc | H01L023/544 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/106465 | - |
| dc.description.abstract | 本創作半導體製程之對準標記，該對準標記具備X、Y兩方向游標尺及半圓游標尺，且該對準標記係由主刻度與次刻度所組成；藉由本創作進行光罩對準校正，毋需多次的對準、曝光、顯影、檢驗誤差之繁瑣流程，僅需一次的對準操作即可以將前後道光罩偏差量控制在0.1μm，完成精確的光罩對準。 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 半導體製程之對準標記 | zh_TW |
| dc.type | Patents | en_US |
| dc.citation.patentcountry | TWN | zh_TW |
| dc.citation.patentnumber | 00528204 | zh_TW |
| Appears in Collections: | Patents | |
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