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dc.contributor.author林岳欽en_US
dc.contributor.author張翼en_US
dc.contributor.author莊庭維en_US
dc.date.accessioned2014-12-16T06:17:41Z-
dc.date.available2014-12-16T06:17:41Z-
dc.date.issued2014-06-16en_US
dc.identifier.govdocH01L029/78zh_TW
dc.identifier.govdocH01L029/40zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/106537-
dc.description.abstract本發明提供一種閘極堆疊結構及包含其之金屬氧化物半導體元件以及其製作方法。上述電晶體之閘極堆疊結構,包含一基板;一半導體層,設置於該基板上;一閘極介電層,設置於該半導體層上,其中該閘極介電層係包含交錯堆疊之氧化鑭(La2O3)及氧化鉿(HfO2)所構成的複合氧化物層;以及一閘極電極層,設置於該閘極介電層上。zh_TW
dc.language.isozh_TWen_US
dc.title閘極堆疊結構及包含其之金屬氧化物半導體元件及閘極堆疊結構之製造方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201423989zh_TW
Appears in Collections:Patents


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