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dc.contributor.authorChen, J. F.en_US
dc.contributor.authorKe, C. T.en_US
dc.contributor.authorHsieh, P. C.en_US
dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorLee, W. I.en_US
dc.contributor.authorLee, S. C.en_US
dc.date.accessioned2014-12-08T15:13:50Z-
dc.date.available2014-12-08T15:13:50Z-
dc.date.issued2007-06-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2748613en_US
dc.identifier.urihttp://hdl.handle.net/11536/10684-
dc.description.abstractThis work presents the deep-level photoluminescence of coherently strained GaAsN/GaAs quantum-well (QW) structures with various GaAsN thicknesses and N contents. A broad deep-level emission at similar to 1.1 eV is observed, whose wavelength is redshifted as the GaAsN thickness increases. Based on its energy separation from the QW emission, this emission is attributed to a transition between the QW electron ground state and a deep level at similar to 0.2 eV above the GaAsN valence-band (VB) edge. This level is shown to be tied to the GaAs band edge. A transition between this level and the GaAs conduction band allows the GaAsN-GaAs band alignment to be evaluated. A type II band lineup is obtained with VB offsets of 0.03 and 0.002 eV for N=0.6% and 1.8%, respectively. The decreased VB offset suggests a transition from type II to type I with increasing N content. Thermal annealing effectively removes this level and improves the QW emission. The concentration of this level is not clearly correlated with N content, suggesting that this level is induced by a low-temperature growth of the GaAsN layer to suppress the composition fluctuation. Given its energy, this level is tentatively assigned to V-Ga. (c) 2007 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleDeep-level emissions in GaAsN/GaAs structures grown by metal organic chemical vapor depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2748613en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume101en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000247625700041-
dc.citation.woscount5-
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