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dc.contributor.author陳佳麟en_US
dc.contributor.authorChen, Jia-linen_US
dc.date.accessioned2014-12-19T03:51:17Z-
dc.date.available2014-12-19T03:51:17Z-
dc.date.issued2006en_US
dc.identifier.issn1811-3095en_US
dc.identifier.urihttp://hdl.handle.net/11536/107689-
dc.identifier.urihttp://www.itl.nctu.edu.tw/tlr_n/ch/list3_2.htmlen_US
dc.subject專利產品zh_TW
dc.subject修理zh_TW
dc.subject再製zh_TW
dc.subject專利權利耗盡zh_TW
dc.subject默示授權zh_TW
dc.subjectPatented productzh_TW
dc.subjectRepairzh_TW
dc.subjectReconstructionzh_TW
dc.subjectPatent exhaustion doctrinezh_TW
dc.subjectImplied licensezh_TW
dc.title美國專利產品的修理與再製之區分與案例類型zh_TW
dc.identifier.journal科技法學評論zh_TW
dc.citation.volume3en_US
dc.citation.issue2en_US
dc.citation.spage203en_US
dc.citation.epage247en_US
dc.contributor.department科技法律研究所zh_TW
dc.contributor.departmentInstitute of Technology Lawen_US
Appears in Collections:Technology Law Review


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