標題: | Effect of top electrode material on resistive switching properties of ZrO2 film memory devices |
作者: | Lin, Chih-Yang Wu, Chen-Yu Wu, Chung-Yi Lee, Tzyh-Cheang Yang, Fu-Liang Hu, Chenming Tseng, Tseung-Yuen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | nonvolatile memory;resistive random access memory (RRAM);resistive switching;ZrO2 |
公開日期: | 1-五月-2007 |
摘要: | The influence of top electrode material on the resistive switching properties of ZrO2 -based memory film using Pt as a bottom electrode was investigated in this letter. In comparison with Pt/ZrO2/Pt and Al/ZrO2/Pt devices, the Ti/ZrO2/Pt device exhibits different resistive switching current-voltage (I-V) curve, which can be traced and reproduced by a dc voltage more than 1000 times only showing a little decrease of resistance ratio between high and low resistance states. Furthermore, the broad dispersions of resistive switching characteristics in the Pt/ZrO2/Pt and Al/ZrO2/Pt devices are generally observed during successive resistive switching, but those dispersions are suppressed by the device using Ti as a top electrode. The reliability results, such as cycling endurance and continuous readout test, are also presented. The write-read-erase-read operations can be over 104 cycles without degradation. No data loss is found upon successive readout after performing various endurance cycles. |
URI: | http://dx.doi.org/10.1109/LED.2007.894652 http://hdl.handle.net/11536/10849 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2007.894652 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 28 |
Issue: | 5 |
起始頁: | 366 |
結束頁: | 368 |
顯示於類別: | 期刊論文 |