完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tsai, Chih-Hao | en_US |
dc.contributor.author | Pan, Fu-Ming | en_US |
dc.contributor.author | Chen, Kuan-Jung | en_US |
dc.contributor.author | Wei, Cheng-Yang | en_US |
dc.contributor.author | Liu, Mei | en_US |
dc.contributor.author | Mo, Chi-Neng | en_US |
dc.date.accessioned | 2014-12-08T15:14:15Z | - |
dc.date.available | 2014-12-08T15:14:15Z | - |
dc.date.issued | 2007-04-16 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.2728761 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10898 | - |
dc.description.abstract | Nanometer-scale gaps in Pd strips are obtained by hydrogen absorption under high pressure treatment. The resulting lattice constant increase due to the Pd phase transformation after hydrogen uptake results in a large compressive stress on the thin Pd films. Under proper geometric arrangement of the Pd electrode within a surface conduction electron (SCE) emitter structure, a single nanogap per SCE device is obtained. A turn-on voltage of 41 V is observed for emitters with a 25 nm gap. (c) 2007 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Nanogap formation by palladium hydrogenation for surface conduction electron emitters fabrication | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.2728761 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 90 | en_US |
dc.citation.issue | 16 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000245870400107 | - |
dc.citation.woscount | 11 | - |
顯示於類別: | 期刊論文 |