完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Shieh, Jia-Min | en_US |
dc.contributor.author | Lai, Yi-Fan | en_US |
dc.contributor.author | Ni, Wei-Xin | en_US |
dc.contributor.author | Kuo, Hao-Chung | en_US |
dc.contributor.author | Fang, Chih-Yao | en_US |
dc.contributor.author | Huang, Jung Y. | en_US |
dc.contributor.author | Pan, Ci-Ling | en_US |
dc.date.accessioned | 2014-12-08T15:14:52Z | - |
dc.date.available | 2014-12-08T15:14:52Z | - |
dc.date.issued | 2007-01-29 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.2450653 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/11216 | - |
dc.description.abstract | The authors report a two-terminal metal-oxide-semiconductor photodetector for which light is absorbed in a capping layer of silicon nanocrystals embedded in a mesoporous silica matrix on p-type silicon substrates. Operated at reverse bias, enhanced photoresponse from 300 to 700 nm was observed. The highest optoelectronic conversion efficiency is as high as 200%. The enhancements were explained by a transistorlike mechanism, in which the inversion layer acts as the emitter and trapped positive charges in the mesoporous dielectric layer assist carrier injection from the inversion layer to the contact, such that the primary photocurrent could be amplified. (c) 2007 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Enhanced photoresponse of a metal-oxide-semiconductor photodetector with silicon nanocrystals embedded in the oxide layer | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.2450653 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 90 | en_US |
dc.citation.issue | 5 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000243977300005 | - |
dc.citation.woscount | 37 | - |
顯示於類別: | 期刊論文 |