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dc.contributor.authorLu, Chun-Anen_US
dc.contributor.authorLin, Pangen_US
dc.contributor.authorLin, Hong-Chingen_US
dc.contributor.authorWang, Sea-Fueen_US
dc.date.accessioned2014-12-08T15:15:00Z-
dc.date.available2014-12-08T15:15:00Z-
dc.date.issued2007-01-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.46.251en_US
dc.identifier.urihttp://hdl.handle.net/11536/11275-
dc.description.abstractIn this study, the effects of the solvent and atmosphere on the thermal decomposition behaviors of silver 2-ethylhexanoate and alpha-terpenol are investigated. Low-curing-temperature silver pastes made from Ag flakes, alpha-terpineol and various amounts of silver 2-ethylhexanoate, were prepared and characterized. The microstructures and resistivities of cured films screen-printed from the pastes were examined. The results of thermal analysis in oxidizing and reducing atmospheres revealed that thermal decomposition is the dominating reaction during the heating process of silver 2-ethylhexanoate, even though the differential scanning calorimetry (DSC) result revealed an exothermic reaction for silver 2-ethylhexanoate heated in air due to oxidation. Thermal decomposition left almost pure Ag particles, which is beneficial for bridging between silver flake particles in the films. On the basis of the theological behavior, microstructural evolution and electrical evaluation, it can be concluded that a low-curing-temperature silver paste with 5 wt % silver 2-ethylhexanoate addition is the best formulation, which possesses shear-thinning and thixotropic properties and a resistivity of 7.8 x 10(-6) Omega cm after being cured at 250 degrees C, which is relatively close to the bulk resistivity of Ag.en_US
dc.language.isoen_USen_US
dc.subjectsilver pasteen_US
dc.subjectmetallo-organic decompositionen_US
dc.subjectresistivityen_US
dc.subjectthermal behavioren_US
dc.titleCharacterization of the low-curing-temperature silver paste with silver 2-ethylhexanoate additionen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.46.251en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume46en_US
dc.citation.issue1en_US
dc.citation.spage251en_US
dc.citation.epage255en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000243858500052-
dc.citation.woscount17-
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