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dc.contributor.authorChen, Ko-Fengen_US
dc.contributor.authorLo, Shen-Chuanen_US
dc.contributor.authorChang, Lien_US
dc.contributor.authorEgerton, Rayen_US
dc.contributor.authorKai, Ji-Jungen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.contributor.authorChen, Fu-Rongen_US
dc.date.accessioned2014-12-08T15:15:01Z-
dc.date.available2014-12-08T15:15:01Z-
dc.date.issued2007en_US
dc.identifier.issn0968-4328en_US
dc.identifier.urihttp://hdl.handle.net/11536/11285-
dc.identifier.urihttp://dx.doi.org/10.1016/j.micron.2006.06.004en_US
dc.description.abstractThis paper demonstrates the applicability of electron-spectroscopic imaging (ESI) for valence-state mapping of the iron oxide system. We have previously developed a set of signal-processing methods for an EST series, to allow mapping Of sp(2)/sp(3) ratio, dielectric function and energy bandgap. In this study, these methods are applied to generate a valence-state map of an iron oxide thin film (Fe/alpha-Fe2O3). Two problems, data undersampling and a convolution effect associated with extraction of the image-spectrum from the core loss image series, were overcome by using cubic-polynomial interpolation and maximum-entropy deconvolution. As a result, the reconstructed image-spectrum obtained from the EST series images has a quality as good as that of conventional electron energy-loss spectra. The L-3/L-2 ratio of the reconstructed EST spectrum is determined to be 3.30 +/- 0.30 and 5.0 +/- 0.30 for Fe and alpha-Fe2O3, respectively. Our L-3/L-2, ratio mapping shows an accurate correspondence across the Cu/Fe/alpha-Fe2O3 region. The effect of delocalization and chromatic aberration on the EST resolution is discussed and estimated to be about 2 nm for the case of L-3/L-2, ratio mapping. (c) 2006 Published by Elsevier Ltd.en_US
dc.language.isoen_USen_US
dc.subjectvalence state mapen_US
dc.subjectelectron spectroscopic imaging(ESI)en_US
dc.subjectiron oxide systemen_US
dc.subjectelectron energy-loss spectroscopy(EELS)en_US
dc.titleValence state map of iron oxide thin film obtained from electron spectroscopy imaging seriesen_US
dc.typeReviewen_US
dc.identifier.doi10.1016/j.micron.2006.06.004en_US
dc.identifier.journalMICRONen_US
dc.citation.volume38en_US
dc.citation.issue4en_US
dc.citation.spage354en_US
dc.citation.epage361en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000244392400004-
dc.citation.woscount2-
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