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dc.contributor.authorYang, Ching-Jungen_US
dc.contributor.authorLiang, Shih-Weien_US
dc.contributor.authorWu, Pu-Weien_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorShieh, Jia-Minen_US
dc.date.accessioned2014-12-08T15:15:11Z-
dc.date.available2014-12-08T15:15:11Z-
dc.date.issued2007en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/11410-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2789777en_US
dc.description.abstractFabrication of anodic aluminum oxide (AAO) on 4 in. glass substrate was demonstrated. Using unique structure with quadruple contacts as electrode support during anodization, we reported gradual transformation from opaque aluminum to transparent AAO over the entire substrate. In contrast, partial transformation was observed with typical single contact approach where growth of insulating AAO inhibited subsequent anodization by interrupting current flow from the contact point. Results from optical spectroscope revealed moderate reduction in transmittance after AAO formation. Successful development of large-area AAO on glass substrate opens up opportunities for AAO templated devices that require a large footprint. (c) 2007 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleFabrication of anodic aluminum oxide film on large-area glass substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2789777en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume10en_US
dc.citation.issue12en_US
dc.citation.spageC69en_US
dc.citation.epageC71en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000250147600012-
dc.citation.woscount7-
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