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dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorFang, Te-Huaen_US
dc.contributor.authorChuu, Der-Sanen_US
dc.contributor.authorJi, Liang-Wenen_US
dc.date.accessioned2014-12-08T15:15:22Z-
dc.date.available2014-12-08T15:15:22Z-
dc.date.issued2006-11-15en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2006.01.022en_US
dc.identifier.urihttp://hdl.handle.net/11536/11542-
dc.description.abstractThe mechanical behavior of GaAs was investigated by nanoindentation with the aid of molecular dynamics (MD) analysis based on the Tersoff potential. Particular attention was devoted to the evolution characterization of dislocation activity during deformation. The transition from elastic-to-plastic deformation behavior was clearly observed as a sudden displacement excursion occurring during the load-displacement curves of larger loads (single pop-in), faster impact velocity and higher temperature (multiple pop-ins). Even for an ultra-small penetration depth (< 3 nm), the MD simulation shows that GaAs deforms plastically and a good description is given in the results. The plastic deformation occurs due to the anticipated change in the twinning and/or dislocation motion. Dislocation nucleations occurred inside the material near the top of the surface and generated loops in the {111} slip planes. The MD analysis of the deformation behavior shows an agreement with that of previous atomic force microscopy (AFM) and transmission electron microscopy (TEM) experiments. (c) 2006 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectmolecular dynamics simulationsen_US
dc.subjectTersoff potentialen_US
dc.subjectGaAsen_US
dc.subjectnanoindentationen_US
dc.titleAtomistic modeling of dislocation activity in nanoindented GaAsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2006.01.022en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume253en_US
dc.citation.issue2en_US
dc.citation.spage833en_US
dc.citation.epage840en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000242647800070-
dc.citation.woscount8-
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