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dc.contributor.authorHuang, Hung-Wenen_US
dc.contributor.authorKao, C. C.en_US
dc.contributor.authorChu, J. T.en_US
dc.contributor.authorLiang, W. D.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorYu, C. C.en_US
dc.date.accessioned2014-12-08T15:15:38Z-
dc.date.available2014-12-08T15:15:38Z-
dc.date.issued2006-10-10en_US
dc.identifier.issn0254-0584en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.matchemphys.2005.11.013en_US
dc.identifier.urihttp://hdl.handle.net/11536/11683-
dc.description.abstractIn this paper, we reported the InGaN/GaN light emitting diode (LED) with a nano-roughened top p-GaN surface which caused by KrF excimer laser-irradiation. Comparing with the conventional LED, the brightness of InGaN/GaN light emitting diode (LED) was raised by a factor of 1.25 at 20 mA after KrF excimer laser-irradiation (250 mJ cm(-2) at 248 nm for 25 ns). Meanwhile, the operation voltage of InGaN/GaN LED was reduced from 3.55 to 3.3 V at 20 mA with 29% reduction in the series resistance. The causes for the brightness increase can be attributed to laser-irradiation induced nano-roughening of p-GaN surface. The reduction in the series resistance can be attributed to the increased contact area of nano-roughened surface and higher hole concentration after laser-irradiation. (c) 2005 Published by Elsevier B.V.en_US
dc.language.isoen_USen_US
dc.subjectgallium nitride (GaN)en_US
dc.subjectlight emitting diode (LED)en_US
dc.subjectexcimer laseren_US
dc.titleImprovement of InGaN/GaN light emitting diode performance with a nano-roughened p-GaN surface by excimer laser-irradiationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.matchemphys.2005.11.013en_US
dc.identifier.journalMATERIALS CHEMISTRY AND PHYSICSen_US
dc.citation.volume99en_US
dc.citation.issue2-3en_US
dc.citation.spage414en_US
dc.citation.epage417en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000240775300039-
dc.citation.woscount7-
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