標題: | The effect of Os interlayers on the thermal stability of magnetic CoFe/OsMn films |
作者: | Peng, Tai-Yen Lo, C. K. Chen, San-Yuan Yao, Y. D. 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Thermal stability;Os interlayer;Mn diffusion;CoFe/Os/OsMn;CoFe/Os/IrMn |
公開日期: | 1-九月-2006 |
摘要: | The thermal stability of a multilayer structure of protection layer/Co(90)Fe(10)/Os (d nm)/Os(20)Mn(80) has been studied as functions of annealing temperature (Tan) and thickness of Osmium (Os) layer. The insertion of a thin Os layer between the Co(90)Fe(10)/Os(20)Mn(80) interface shows better thermal stability. No diffusion evidence was found for samples with d >= 0:3 nm as examined by Auger electron spectroscopy depth profile at different annealing temperatures up to 400 degrees C. These samples with Os layer showed the same magnetic behavior and the hysteresis loop with squareness (S) larger than 0.9 were observed before and after annealing. (C) 2006 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.jmmm.2006.01.173 http://hdl.handle.net/11536/11844 |
ISSN: | 0304-8853 |
DOI: | 10.1016/j.jmmm.2006.01.173 |
期刊: | JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS |
Volume: | 304 |
Issue: | 1 |
起始頁: | E50 |
結束頁: | E52 |
顯示於類別: | 期刊論文 |