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dc.contributor.authorLin, Chun-Chiehen_US
dc.contributor.authorTu, Bing-Chungen_US
dc.contributor.authorLin, Chao-Chengen_US
dc.contributor.authorLin, Chen-Hsien_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:15:52Z-
dc.date.available2014-12-08T15:15:52Z-
dc.date.issued2006-09-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2006.880660en_US
dc.identifier.urihttp://hdl.handle.net/11536/11849-
dc.description.abstractThe resistive switching behaviors of sputtered V-doped SrZrO3 (V:SZO) memory films were investigated in this letter. The current states of the memory films were switched between high current state (H-state) and low current state (L-state). The resistance ratio of the two current states was over 1000 at a read voltage. The switching mechanism from L- to H-state corresponds to the formation of current paths. However, this mechanism from H- to L-state is thought to be due to the fact that the defects present in the V:SZO film randomly trap electrons, and hence, the current paths are ruptured. The conduction mechanism of the H-state is dominated by ohmic conduction, whereas the L-state conduction is dominated by Frenkel-Poole emission. The polarity direction of the resistive switching is an intrinsic property of the SrZrO3 oxides. The V:SZO films with high uniformity and good stability are expected to be used in nonvolatile memory.en_US
dc.language.isoen_USen_US
dc.subjectconduction mechanismen_US
dc.subjectnonvolatile memory (NVM)en_US
dc.subjectresistive random access memory (RRAM)en_US
dc.subjectresistive switchingen_US
dc.subjectSrZrO3en_US
dc.titleResistive switching mechanisms of V-doped SrZrO3 memory filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2006.880660en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume27en_US
dc.citation.issue9en_US
dc.citation.spage725en_US
dc.citation.epage727en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000240008800006-
dc.citation.woscount53-
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