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dc.contributor.authorPearn, WLen_US
dc.contributor.authorLin, PCen_US
dc.contributor.authorChang, YCen_US
dc.contributor.authorWu, CWen_US
dc.date.accessioned2014-12-08T15:16:07Z-
dc.date.available2014-12-08T15:16:07Z-
dc.date.issued2006-08-01en_US
dc.identifier.issn0740-817Xen_US
dc.identifier.urihttp://dx.doi.org/10.1080/07408170600692150en_US
dc.identifier.urihttp://hdl.handle.net/11536/11958-
dc.description.abstractProcess capability indices provide numerical measures on whether or not a process is able to produce products that meet prespecified quality targets and are often used by manufacturers to evaluate manufacturing performance. Although process yield is the primary focus of the performance criteria, a formula that combines the yield and the average process loss, called the quality yield index, has been developed. This index, the quality yield, can be viewed as the conventional process yield minus the truncated expected relative process loss within the specifications. Although cases with symmetric tolerances dominate in practical situations, cases with asymmetric tolerances can also occur. In this paper, we generalize the quality yield index for asymmetric tolerances. The generalization technique is justified, and some statistical properties of the estimated generalization are investigated. An application example on high-density light emitting diodes is also presented to illustrate the applicability of the generalization.en_US
dc.language.isoen_USen_US
dc.titleQuality yield measure for processes with asymmetric tolerancesen_US
dc.typeArticleen_US
dc.identifier.doi10.1080/07408170600692150en_US
dc.identifier.journalIIE TRANSACTIONSen_US
dc.citation.volume38en_US
dc.citation.issue8en_US
dc.citation.spage619en_US
dc.citation.epage633en_US
dc.contributor.department工業工程與管理學系zh_TW
dc.contributor.departmentDepartment of Industrial Engineering and Managementen_US
dc.identifier.wosnumberWOS:000238479800001-
dc.citation.woscount10-
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