標題: Study on the voltage-controlled-oscillator circuit implemented with Al/HfO2/Si capacitors
作者: Pan, Tsai-Sheng
Chang, Li-Chun
Ho, Chia-Cheng
Chiou, Bi-Shiou
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: voltage controlled oscillator;varactors;ferroelectric films;harmonic distortion
公開日期: 2007
摘要: Voltage controlled oscillator (VCO) is the most ubiquitous element in all communication systems, wired or wireless. In a wireless system the quality of the communication link is determined in large part by the characteristics of the VCO. The capacitance of metal/insulator/semiconductor (MIS) shows larger variation from the accumulation region to the depletion region. The dielectric constant of hafnium dioxide is larger (around 25) than that Of SiO2 (similar to 3.9). Al/Hafnium oxide (HfO2)/Si show a field dependent permittivity and can be used as a dielectric in voltage tunable capacitors. In this work, we used two types of tunable capacitor in the VCO(LC tank and Colpitts circuit) integrated within PCB: one is Al/HfO2/Si (HfO) capacitor, the other one is Philips BB 135 p-n junction capacitor for a control. The maximum MIS capacitance ratio is 4.25. The Al/HfO2/Si capacitors are then implemented as the varactor in the VCO circuit.
URI: http://hdl.handle.net/11536/12012
ISBN: 978-1-4244-1636-3
期刊: 2007 INTERNATIONAL MICROSYSTEMS, PACKAGING, ASSEMBLY AND CIRCUITS TECHNOLOGY CONFERENCE, PROCEEDINGS OF TECHNICAL PAPERS
起始頁: 153
結束頁: 156
顯示於類別:會議論文