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dc.contributor.authorChen, JFen_US
dc.contributor.authorHsiao, RSen_US
dc.contributor.authorHsieh, PCen_US
dc.contributor.authorWang, JSen_US
dc.contributor.authorChi, JYen_US
dc.date.accessioned2014-12-08T15:16:22Z-
dc.date.available2014-12-08T15:16:22Z-
dc.date.issued2006-06-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2209092en_US
dc.identifier.urihttp://hdl.handle.net/11536/12141-
dc.description.abstractEffect of growth rate on the composition fluctuation is investigated in In0.34Ga0.66As0.98N0.02/GaAs single quantum wells (QWs) by photoluminescence (PL), transmission electron microscopy, and admittance spectroscopy. In an InGaAsN layer grown at a normal growth rate, the PL spectra show a low-energy bump at the tail of an InGaAsN emission, suggesting the presence of composition fluctuation. Lowering the growth rate degrades the composition fluctuation by segregating into bimodal phases of an InGaAsN and InGaAs-rich phase. Further lowering the growth rate leads to a three-dimensional growth and enhances the InGaAs-rich phase. The carrier distribution for the InGaAsN layer grown at the normal rate shows a carrier bump at the tail of a strong accumulation peak, suggesting the presence of an electron state below the QW ground state. The admittance spectroscopy shows that the activation energy (32 meV) of this electron state is comparable to the energy separation (30 meV) between the InGaAsN emission and the low-energy bump, and thus it is possible that the composition fluctuation actually induces an electron state closely below the QW ground state. (c) 2006 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleEffect of growth rate on the composition fluctuation of InGaAsN/GaAs single quantum wellsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2209092en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume99en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000238730000062-
dc.citation.woscount4-
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