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dc.contributor.authorChen, J. F.en_US
dc.contributor.authorHsiao, R. S.en_US
dc.contributor.authorHuang, W. D.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorWang, J. S.en_US
dc.contributor.authorChi, J. Y.en_US
dc.date.accessioned2014-12-08T15:16:25Z-
dc.date.available2014-12-08T15:16:25Z-
dc.date.issued2006-06-05en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2212064en_US
dc.identifier.urihttp://hdl.handle.net/11536/12162-
dc.description.abstractThe onset of strain relaxation and induced defects in InAs0.94Sb0.06 quantum dots are investigated. We show that the relaxation causes partial carrier depletion in the dots and drastic carrier depletion in the top GaAs layer due to the introduction of two defect traps At 0.35 and 0.64 eV. This result is consistent with transmission electron microscopy data which show misfit dislocations on the edges of the dot upper boundary and threading dislocations in the top GaAs layer. The bottom GaAs layer is dislocation-free, and thus the strain relaxation may initially occur on the edges of the dots. (c) 2006 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleStrain relaxation and induced defects in InAsSb self-assembled quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2212064en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume88en_US
dc.citation.issue23en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000238914500066-
dc.citation.woscount12-
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