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dc.contributor.authorLiu, SHen_US
dc.contributor.authorLi, TCen_US
dc.contributor.authorChen, Cen_US
dc.contributor.authorShieh, JMen_US
dc.contributor.authorDai, BTen_US
dc.contributor.authorHensen, Ken_US
dc.contributor.authorCheng, SSen_US
dc.date.accessioned2014-12-08T15:16:39Z-
dc.date.available2014-12-08T15:16:39Z-
dc.date.issued2006-05-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.3976en_US
dc.identifier.urihttp://hdl.handle.net/11536/12287-
dc.description.abstractIn this study, we investigate how the degradation of poly(ethylene glycol) (PEG) additives in Cu electroplating electrolytes influences the gaps filling of damascene features and the roughness of plated surfaces. The cleavage of PEG, whose reaction is enhanced by a high bias current and more plating cycles, not only diminishes the inhibition effect of the electrolytes, but also enables the formation of enormous complexes of short-chain PEG-Cu far from the reacting surfaces. Hence, the more plating cycles performed, the worse the gaps filling characteristic and the rougher the plated surfaces. Furthermore, an overshoot phenomenon on the transient cells voltage for PEG-containing electrolytes is observed and explained well by a dynamic equilibrium between PEG absorption ability and Cu reduction speed. Accordingly, the change in overshoot shape is closely related to PEG aging and this fact is employed to examine the reliability of electrolytes.en_US
dc.language.isoen_USen_US
dc.subjectCu electroplatingen_US
dc.subjectsuppressoren_US
dc.titleAging influence of poly(ethylene glycol) suppressors of Cu electrolytes on gaps fillingen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.3976en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue5Aen_US
dc.citation.spage3976en_US
dc.citation.epage3980en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000237713700027-
dc.citation.woscount2-
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