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dc.contributor.authorLee, YJen_US
dc.contributor.authorHwang, JMen_US
dc.contributor.authorHsu, TCen_US
dc.contributor.authorHsieh, MHen_US
dc.contributor.authorJou, MJen_US
dc.contributor.authorLee, BJen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:16:42Z-
dc.date.available2014-12-08T15:16:42Z-
dc.date.issued2006-05-01en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2006.874737en_US
dc.identifier.urihttp://hdl.handle.net/11536/12320-
dc.description.abstractGaN-based light-emitting diodes (LEDs) with emitting wavelength of 450 nm were grown on patterned sapphire substrates (PSSs) fabricated by chemical wet etching. The crystallography-etched facet was {1-102} R-plane with a 57 degrees against {001} C-axis and had superior capability for enhancing light extraction efficiency. The light output power of the PSS LED was 1.15 times higher than that of the conventional LED at an injection current of 20 mA. The output power and external quantum efficiency were estimated to be 9 mW and 16.4%, respectively. The improvement was attributed not only to geometrical shapes of {1-102} crystallography-etched facets that efficiently scatter the guided light to find escape cones, but also to dislocation density reduction by adopting the PSS growth scheme.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectlight-emitting diode (LED)en_US
dc.subjectsapphire chemical wet etchingen_US
dc.titleEnhancing the output power of GaN-based LEDs grown on wet-etched patterned sapphire substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2006.874737en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume18en_US
dc.citation.issue9-12en_US
dc.citation.spage1152en_US
dc.citation.epage1154en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000238708300052-
dc.citation.woscount146-
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