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dc.contributor.authorHuang, Yin-Hsienen_US
dc.contributor.authorHsieh, Tsung-Eongen_US
dc.date.accessioned2015-07-21T08:29:44Z-
dc.date.available2015-07-21T08:29:44Z-
dc.date.issued2015-01-01en_US
dc.identifier.issn1290-0729en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.ijthermalsci.2014.08.004en_US
dc.identifier.urihttp://hdl.handle.net/11536/123857-
dc.description.abstractThermal conductivity of Ge2Sb2Te5 (GST) and Ce-doped GST (Ce-GST) chalcogenide thin films and thermal boundary resistances (TBR) at the interface of chalcogenides and thin films such as ZnS:SiO2 and TiN were measured by the 3-omega (3 omega) method in conjunction with the plywood-structure samples. The measured results were then implanted in the finite-element simulation for analyzing the thermal conduction behaviors of phase-change memory (PCM) devices. The analysis utilizing a three-dimensional fully coupled electric and thermal model indicated that the TBR at the interface of chalcogenide and TiN contact layer is the key physical property affecting the temperature profile and heating efficiency of PCM cells subject to a pulse heating operation. It was found the TBR significantly alters the temperature uniformity and suppresses the programming current. For instance, the presence of TBRGST/TiN of 7.01 x 10(-8) m(2) K/W led to a 30% reduction of programming power of PCM cell while the TBRce-GST/TiN of 8.82 x 10(-8) m(2) K/W led to a 27% power reduction in comparison with the case without considering the TBR property. As to the doping effect, higher resistivity of Ce-GST layer led to the decrease of programming current (up to 39% reduction in I-reset) and the low thermal conductivity feature of Ce-GST provided a better thermal confinement effect in PCM cells. The simulation results illustrated that the TBR property must be taken into consideration in optimizing the PCM device structure and this limitation could be remedied by the doping in chalcogenide programming layer. (C) 2014 Elsevier Masson SAS. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectPhase-change memory (PCM)en_US
dc.subjectChalcogenidesen_US
dc.subject3-Omega methoden_US
dc.subjectThermal conductivityen_US
dc.subjectFinite-element simulationen_US
dc.titleEffective thermal parameters of chalcogenide thin films and simulation of phase-change memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.ijthermalsci.2014.08.004en_US
dc.identifier.journalINTERNATIONAL JOURNAL OF THERMAL SCIENCESen_US
dc.citation.volume87en_US
dc.citation.spage207en_US
dc.citation.epage214en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000344427600018en_US
dc.citation.woscount0en_US
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