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dc.contributor.authorChang, Y. W.en_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorChang, T. C.en_US
dc.contributor.authorZhan, C. J.en_US
dc.contributor.authorJuang, J. Y.en_US
dc.contributor.authorHuang, Annie T.en_US
dc.date.accessioned2015-07-21T11:21:00Z-
dc.date.available2015-07-21T11:21:00Z-
dc.date.issued2014-12-15en_US
dc.identifier.issn0167-577Xen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.matlet.2014.08.156en_US
dc.identifier.urihttp://hdl.handle.net/11536/123861-
dc.description.abstractThe electromigration behavior was investigated in 18-mu m SnAg microbumps at 150 degrees C. The monitored resistance increase abruptly soon after the current stressing of 4.6 x 10(4) A/cm(2) was applied but the resistance rose much slower after a certain period of time. The formation of the high-resistivity Ni3Sn4 intermetallic compounds (IMCs) was responsible for the abrupt resistance increase in the beginning of the current stressing. The whole solder joint was transformed into an IMC joint. Because IMC has a higher electromigration resistance than the solder, a much slower increase in resistance was resulted after the solder joint was transformed into IMCs. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectPhase transformationen_US
dc.subjectMetallic compositesen_US
dc.subjectIntermetallic compounden_US
dc.subjectSolderen_US
dc.subjectElectromigrationen_US
dc.titleFast phase transformation due to electromigration of 18 mu m microbumps in three-dimensional integrated-circuit integrationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.matlet.2014.08.156en_US
dc.identifier.journalMATERIALS LETTERSen_US
dc.citation.volume137en_US
dc.citation.spage136en_US
dc.citation.epage138en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000345469700037en_US
dc.citation.woscount1en_US
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