完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWang, S. Y.en_US
dc.contributor.authorRen, Y. P.en_US
dc.contributor.authorChang, K. P.en_US
dc.contributor.authorCheng, C. W.en_US
dc.contributor.authorChen, J. K.en_US
dc.contributor.authorTzou, D. Y.en_US
dc.date.accessioned2015-07-21T08:27:56Z-
dc.date.available2015-07-21T08:27:56Z-
dc.date.issued2014-06-01en_US
dc.identifier.issn1880-0688en_US
dc.identifier.urihttp://dx.doi.org/10.2961/jlmn.2014.02.0002en_US
dc.identifier.urihttp://hdl.handle.net/11536/124013-
dc.description.abstractThermal ablation of copper films by a single Ti:Sapphire femtosecond laser pulse of wavelength 800 nm and duration 100 fs was investigated experimentally and theoretically. The laser experiments were performed; the ablation depth and crater profiles were measured for laser fluences up to 1037 J/cm(2). A comprehensive axisymmetric model, including a two-temperature model, phase change models for rapid melting and evaporation, and a phase explosion model for ejecting metastable liquid and vapor, was developed to simulate the laser material ablation process. The simulated ablation depths and crater profiles agree well with the experimental measurements.en_US
dc.language.isoen_USen_US
dc.subjectfemtosecond laseren_US
dc.subjectaxisymmetric modelen_US
dc.subjectthermal ablationen_US
dc.subjectcopper filmen_US
dc.titleAblation of Copper by a Single Ultrashort Laser Pulseen_US
dc.typeArticleen_US
dc.identifier.doi10.2961/jlmn.2014.02.0002en_US
dc.identifier.journalJOURNAL OF LASER MICRO NANOENGINEERINGen_US
dc.citation.spage88en_US
dc.citation.epage92en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000345221200002en_US
dc.citation.woscount0en_US
顯示於類別:期刊論文