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dc.contributor.authorWu, Shu-Huaen_US
dc.contributor.authorYu, Chang-Hungen_US
dc.contributor.authorChiang, Chun-Hsienen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2015-07-21T08:29:05Z-
dc.date.available2015-07-21T08:29:05Z-
dc.date.issued2015-01-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2014.2375871en_US
dc.identifier.urihttp://hdl.handle.net/11536/124040-
dc.description.abstractThis paper provides an analytical subthreshold model for trigate MOSFETs with thin buried oxide (BOX) for multithreshold (multi-V-th) applications. This model shows a fairly good scalability in substrate bias and BOX thickness, which is crucial to the prediction of multi-Vth modulation through BOX. In addition, we demonstrate the application of our model in multi-V-th device design for trigate GeOI p-MOSFETs with the body-effect coefficient (gamma) over a wide range of design space efficiently examined. We have shown an enhanced multi-Vth modulation behavior in trigate GeOI p-MOSFETs. Our study indicates that, for a given subthreshold swing and gamma, the GeOI trigate p-MOSFET can possess a higher fin aspect ratio than the SOI counterpart.en_US
dc.language.isoen_USen_US
dc.subjectGeOIen_US
dc.subjectmulti-V-th designen_US
dc.subjectmultigate MOSFETen_US
dc.subjectSOIen_US
dc.subjectsubthresholden_US
dc.subjecttrigate MOSFETen_US
dc.titleInvestigation of Multi-V-th Efficiency for Trigate GeOI p-MOSFETs Using Analytical Solution of 3-D Poisson\'s Equationen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2014.2375871en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume62en_US
dc.citation.spage88en_US
dc.citation.epage93en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000346979800013en_US
dc.citation.woscount0en_US
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