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dc.contributor.authorLiu, Chih-Tungen_US
dc.contributor.authorWu, Ching-Jungen_US
dc.contributor.authorYang, Yi-Weien_US
dc.contributor.authorLin, Zhi-Huaen_US
dc.contributor.authorWu, Jong-Shinnen_US
dc.contributor.authorHsiao, Shun-Chungen_US
dc.contributor.authorLin, Chun-Pinen_US
dc.date.accessioned2015-07-21T11:20:25Z-
dc.date.available2015-07-21T11:20:25Z-
dc.date.issued2014-12-01en_US
dc.identifier.issn0093-3813en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TPS.2014.2345096en_US
dc.identifier.urihttp://hdl.handle.net/11536/124108-
dc.description.abstractThe reactive chemical species generated in an atmospheric-pressure plasma jet (APPJ), such as hydroxyl radical and atomic oxygen, are generally regarded as the major sources for several biomedical applications. In this paper, we propose an APPJ with a 25-kHz high-voltage powered stainless steel tube fixed inside a quartz tube and an aluminum grounded electrode that is wrapped around the quartz tube. The results show that the radical intensities of atomic oxygen and hydroxyl radical, gas temperature, and power absorption increase with increasing distance of discharge gap distance under the same applied voltage. Increasing the width of grounded electrode increases gas temperature and causes higher power absorption but only slight change of radical generation. We have applied the APPJ with the conditions of highest radical generation (grounded electrode width = discharge gap distance = 15 mm) for effectively sterilizing Streptococcus mutans within 15 s, which shows a highly potential application for root canal disinfection.en_US
dc.language.isoen_USen_US
dc.subjectAtmospheric-pressure plasmaen_US
dc.subjectdental sterilizationen_US
dc.subjectdischarge gapen_US
dc.subjectelectrodes arrangementen_US
dc.subjectplasma medicineen_US
dc.titleAtomic Oxygen and Hydroxyl Radical Generation in Round Helium-Based Atmospheric-Pressure Plasma Jets by Various Electrode Arrangements and Its Application in Sterilizing Streptococcus mutansen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TPS.2014.2345096en_US
dc.identifier.journalIEEE TRANSACTIONS ON PLASMA SCIENCEen_US
dc.citation.volume42en_US
dc.citation.issue12en_US
dc.citation.spage3830en_US
dc.citation.epage3836en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000346072900029en_US
dc.citation.woscount0en_US
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