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dc.contributor.authorLee, Ko-Chunen_US
dc.contributor.authorFan, Ming-Longen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2015-07-21T08:29:06Z-
dc.date.available2015-07-21T08:29:06Z-
dc.date.issued2015-02-01en_US
dc.identifier.issn0026-2714en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.microrel.2014.11.012en_US
dc.identifier.urihttp://hdl.handle.net/11536/124338-
dc.description.abstractThis paper investigates and compares the impacts of metal-gate work-function variation on important analog figures-of-merit (FOMs) for TFET and FinFET devices using 3-D atomistic TCAD simulations. Our study indicates that, at 0.6 V supply voltage and 0.2 V gate-voltage overdrive, TFET exhibits superior variation immunity regarding transconductance to drain-current ratio (g(m)/I-DS), output resistance (R-out) and intrinsic gain, and comparable variability in g(m) and cutoff frequency (f(T)) as compared with the FinFET counterparts. In addition, how the correlations between pertinent parameters (e.g., g(m) and R-out) impact the variation immunity of important analog FOMs are analyzed. Our study may provide insights for low-voltage analog design using TFET/FinFET technologies. (C) 2014 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectTFETen_US
dc.subjectWork-function variationen_US
dc.subjectAnalog FOMen_US
dc.subjectOutput resistanceen_US
dc.subjectIntrinsic gainen_US
dc.subjectCutoff frequencyen_US
dc.titleInvestigation and comparison of analog figures-of-merit for TFET and FinFET considering work-function variationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.microrel.2014.11.012en_US
dc.identifier.journalMICROELECTRONICS RELIABILITYen_US
dc.citation.volume55en_US
dc.citation.spage332en_US
dc.citation.epage336en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000349724600005en_US
dc.citation.woscount0en_US
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