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dc.contributor.authorChuang, P. K.en_US
dc.contributor.authorTeng, I. J.en_US
dc.contributor.authorWang, W. H.en_US
dc.contributor.authorKuo, C. T.en_US
dc.date.accessioned2014-12-08T15:16:59Z-
dc.date.available2014-12-08T15:16:59Z-
dc.date.issued2006-04-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2005.10.046en_US
dc.identifier.urihttp://hdl.handle.net/11536/12438-
dc.description.abstractIn order to examine the consequence of replacing hydrogen gas with high substrate bias, processes were successfully demonstrated to fabricate various carbon catalyst-assisted nanostructures, including carbon nanotubes (CNTs), by microwave plasma chemical vapor deposition (MPCVD), under the pure CH4 as the only source gas and without additional H-2 gas introduction. The Si wafers were first deposited with catalyst by physical vapor deposition (PVD), and then followed by H-plasma pretreatment to obtain the well-distributed catalyst particles on wafer. The pretreated specimens were then deposited in MPCVD to manipulate the various carbon nanostructures. The main process parameters include catalyst material (Co, Ni and Fe), the substrate bias (0 to - 320 V), and deposition time (1 to 20 min). The as-deposited nanostructures were characterized by SEM, HRTEM, Raman spectroscopy, and field emission I-V measurement. The results indicate that the various nanostructures on Si wafers can be manipulated under sufficient high negative substrate bias (>-200 V) without the additional hydrogen introduction. These results also improve our understanding on growth mechanisms of CNTs or other nanostrucrures, where the most of the proposed mechanisms in the literature were too much emphasis on the role of hydrogen. On important process parameters, except the substrate bias, it is interesting to note that effect of deposition time on nanostructures is essentially to extend the more CNTs into the plasma zone, which can result in different purification effect on CNTs, vary the alignment and sizes of CNTs, and expose the more nanostructures near the substrate surface. Under the present deposition 2 conditions, the best nanostructures with the best field emission properties (Turn-on field = 5 V/mu m, maximum current density > 35 mA/cm(2)) are the well-aligned CNTs with proper tube number densities, purities and sizes. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcarbon nanotubes (CNTs)en_US
dc.subjectmicrowave plasma chemical vapor deposition (MPCVD)en_US
dc.subjectsubstrate biasen_US
dc.subjectfield emissionen_US
dc.titleEffect of substrate bias on growth and properties of carbon nanotubes deposited under no hydrogen introduction by MPCVDen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.diamond.2005.10.046en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume15en_US
dc.citation.issue4-8en_US
dc.citation.spage1053en_US
dc.citation.epage1058en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000239157000122-
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