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dc.contributor.authorChen, Shih-Chenen_US
dc.contributor.authorHsieh, Dan-Huaen_US
dc.contributor.authorJiang, Hsinen_US
dc.contributor.authorLiao, Yu-Kuangen_US
dc.contributor.authorLai, Fang-Ien_US
dc.contributor.authorChen, Chyong-Huaen_US
dc.contributor.authorLuo, Chih Weien_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.contributor.authorChueh, Yu-Lunen_US
dc.contributor.authorWu, Kaung-Hsiungen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2015-07-21T11:21:10Z-
dc.date.available2015-07-21T11:21:10Z-
dc.date.issued2014-06-02en_US
dc.identifier.issn1556-276Xen_US
dc.identifier.urihttp://dx.doi.org/10.1186/1556-276X-9-280en_US
dc.identifier.urihttp://hdl.handle.net/11536/124419-
dc.description.abstractIn this work, CuIn1-xGaxSe2 (CIGS) thin films were prepared by nanosecond (ns)- and femtosecond (fs)-pulsed laser deposition (PLD) processes. Different film growth mechanisms were discussed in perspective of the laser-produced plasmas and crystal structures. The fs-PLD has successfully improved the inherent flaws, Cu-2 (-) Se-x, and air voids ubiquitously observed in ns-PLD-derived CIGS thin films. Moreover, the prominent antireflection and excellent crystalline structures were obtained in the fs-PLD-derived CIGS thin films. The absorption spectra suggest the divergence in energy levels of radiative defects brought by the inhomogeneous distribution of elements in the fs-PLD CIGS, which has also been supported by comparing photoluminescence (PL) spectra of ns- and fs-PLD CIGS thin films at 15 K. Finally, the superior carrier transport properties in fs-PLD CIGS were confirmed by fs pump-probe spectroscopy and four-probe measurements. The present results indicate a promising way for preparing high-quality CIGS thin films via fs-PLD.en_US
dc.language.isoen_USen_US
dc.subjectCIGSen_US
dc.subjectPulsed laser depositionen_US
dc.subjectFemtoseconden_US
dc.subjectPhotoluminescenceen_US
dc.subjectPump probeen_US
dc.titleGrowth and characterization of Cu(In,Ga)Se-2 thin films by nanosecond and femtosecond pulsed laser depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1186/1556-276X-9-280en_US
dc.identifier.journalNANOSCALE RESEARCH LETTERSen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000350730400001en_US
dc.citation.woscount1en_US
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