完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLin, KLen_US
dc.contributor.authorLin, CCen_US
dc.date.accessioned2014-12-08T15:17:00Z-
dc.date.available2014-12-08T15:17:00Z-
dc.date.issued2006-04-01en_US
dc.identifier.issn0002-7820en_US
dc.identifier.urihttp://dx.doi.org/10.1111/j.1551-2916.2005.00877.xen_US
dc.identifier.urihttp://hdl.handle.net/11536/12448-
dc.description.abstractThe diffusional reaction between titanium and zirconia was carried out isothermally at 1550 degrees C in argon. The distinct reaction layers in the reaction-affected zone between Ti and ZrO2 were investigated using analytical scanning electron microscopy, analytical transmission electron microscopy, and electron probe microanalyses. In the metal side, there existed five reaction layers in a sequence of alpha-Ti(O), Ti2ZrO+alpha-Ti(O, Zr), Ti2ZrO+alpha-Ti(O, Zr)+beta'-Ti (O, Zr), alpha-Ti (O, Zr)+beta'-Ti (O, Zr), and beta'-Ti (Zr, O) after cooling. In the zirconia side, two reaction layers were found: near the original interface, beta'-Ti coexisted with fine spherical c-ZrO2-x and Chinese-script-like c-ZrO2-x, which dissolved a significant amount of Y2O3 in solid solution; further away from the original interface, the coarsened intergranular alpha-Zr was excluded from metastable ZrO2-x, resulting in the lenticular t-ZrO2-x and ordered c-ZrO2-x. An attempt was made to determine and propose the microstructural evolution and formation mechanism of the reaction layers between titanium and zirconia isothermally annealed at 1550 degrees C.en_US
dc.language.isoen_USen_US
dc.titleMicrostructural evolution and formation mechanism of the interface between titanium and zirconia annealed at 1550 degrees Cen_US
dc.typeArticleen_US
dc.identifier.doi10.1111/j.1551-2916.2005.00877.xen_US
dc.identifier.journalJOURNAL OF THE AMERICAN CERAMIC SOCIETYen_US
dc.citation.volume89en_US
dc.citation.issue4en_US
dc.citation.spage1400en_US
dc.citation.epage1408en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000236175200035-
dc.citation.woscount5-
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