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dc.contributor.authorWang, W. H.en_US
dc.contributor.authorPeng, Y. R.en_US
dc.contributor.authorChuang, P. K.en_US
dc.contributor.authorKuo, C. T.en_US
dc.date.accessioned2014-12-08T15:17:02Z-
dc.date.available2014-12-08T15:17:02Z-
dc.date.issued2006-04-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2005.10.050en_US
dc.identifier.urihttp://hdl.handle.net/11536/12465-
dc.description.abstractWe present the microstructures and growth mechanism of networks of single-walled carbon nanotubes (SWNTs) fabricated by buffer layer-assisted microwave plasma chemical vapor deposition (MPCVD) at relatively low temperatures. The morphologies and bonding structures of carbon nanostructures were characterized by field emission scanning electron microscopy (FESEM), high-resolution transmission electron microscopy (HRTEM), and Raman Spectroscopy. Additionally, the surface roughness of buffer layer and its bonding structures with catalyst atom are analyzed by atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. Analytical results demonstrate that networks of CNTs are formed by bundles or individual SWNTs. We suggest that the formation of SWNTs networks at low temperature may follow the root-growth mechanism. The differences comparing with previous growth mechanism are that the nuclei formation resulted from the rough surface of the buffer layer, and dissolution of carbon in catalyst will be enhanced due to the surface diffusion of the buffer layer. These unique effects from the buffer layer can provide favorable conditions to grow SWNTs at relatively low process temperatures. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectsingle-walled carbon nanotubes (SWNTs)en_US
dc.subjectbuffer layeren_US
dc.subjectnetworksen_US
dc.subjectmicrowave plasma chemical vapor deposition (MPCVD)en_US
dc.titleLow-temperature growth mechanism of SW-NTs networks by buffer layer-assisted MPCVDen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.diamond.2005.10.050en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume15en_US
dc.citation.issue4-8en_US
dc.citation.spage1047en_US
dc.citation.epage1052en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000239157000121-
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