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dc.contributor.authorLiu, CYen_US
dc.contributor.authorWang, Aen_US
dc.contributor.authorJang, WYen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2014-12-08T15:17:04Z-
dc.date.available2014-12-08T15:17:04Z-
dc.date.issued2006-03-21en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/39/6/022en_US
dc.identifier.urihttp://hdl.handle.net/11536/12477-
dc.description.abstractSputter-deposited V-doped SrZrO3 (SZO) films were deposited on textured LaNiO3 (LNO) bottom electrodes to investigate the resistance switching properties and reliabilities. The microstructures of the SZO and LNO films were characterized by x-ray diffraction. The resistance of the AI/V-doped SZO/LNO sandwich structures can be reversibly switched by operating with dc bias voltages or voltage pulses. The device with [100] orientated SZO film had better resistance switching properties and the resistance ratio was more than 1000. The effect of thermal treatment on resistance switching properties was investigated and different behaviour of the two leakage-states was found. Finally, the reliability of the device was also investigated. The device with the properties of reversible resistance switching and non-destructive readout is suitable for nonvolatile memory application.en_US
dc.language.isoen_USen_US
dc.titleElectrical properties of resistance switching V-doped SrZrO3 films on textured LaNiO3 bottom electrodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0022-3727/39/6/022en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.citation.volume39en_US
dc.citation.issue6en_US
dc.citation.spage1156en_US
dc.citation.epage1160en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000236747800023-
dc.citation.woscount20-
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