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dc.contributor.authorChang, Kuan-Changen_US
dc.contributor.authorTsai, Tsung-Mingen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorZhang, Ruien_US
dc.contributor.authorChen, Kai-Huangen_US
dc.contributor.authorChen, Jung-Huien_US
dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorHuang, Hui-Chunen_US
dc.contributor.authorZhang, Weien_US
dc.contributor.authorLin, Chih-Yangen_US
dc.contributor.authorTseng, Yi-Tingen_US
dc.contributor.authorLin, Hua-Chingen_US
dc.contributor.authorZheng, Jin-Chengen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2015-07-21T08:28:10Z-
dc.date.available2015-07-21T08:28:10Z-
dc.date.issued2015-06-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2015.2426055en_US
dc.identifier.urihttp://hdl.handle.net/11536/124787-
dc.description.abstractSupercritical carbon dioxide (SCCO2) fluid technology was applied to indium-tin-oxide (ITO) electrode to improve the resistive switching characteristic of silicon oxide RRAM through hydride oxidation for the first time. We found device power consumption can be effectively reduced so that side effects can be also restricted under device operation. By applying SCCO2 fluid, more oxygen ions will be introduced into the ITO electrode and thus the participation of net oxygen ions in the RRAM redox reaction will increase. Fourier transform spectroscopy and X-ray photoelectron spectroscopy were used to confirm hydride oxidation on ITO electrode. Combined with the current fitting results, we proposed a reaction model to explain the improvement of resistive switching in RRAM by SCCO2 fluids.en_US
dc.language.isoen_USen_US
dc.subjectRRAMen_US
dc.subjectSCCO2en_US
dc.subjectITOen_US
dc.subjectSiO2en_US
dc.titleImprovement of Resistive Switching Characteristic in Silicon Oxide-Based RRAM Through Hydride-Oxidation on Indium Tin Oxide Electrode by Supercritical CO2 Fluiden_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2015.2426055en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume36en_US
dc.citation.spage558en_US
dc.citation.epage560en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000355252300010en_US
dc.citation.woscount0en_US
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