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dc.contributor.authorLin, Taiy-Inen_US
dc.contributor.authorHsieh, Chih-Yungen_US
dc.contributor.authorLi, I-Yinen_US
dc.contributor.authorLeu, Jihperngen_US
dc.date.accessioned2015-07-21T08:29:19Z-
dc.date.available2015-07-21T08:29:19Z-
dc.date.issued2015-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/JJAP.54.046601en_US
dc.identifier.urihttp://hdl.handle.net/11536/124846-
dc.description.abstractThe bending curvature, stresses, and stress relaxation of various multi-layered structures with different adhesive layers pertaining to the polarizer in a thin-film transistor liquid-crystal display (TFT-LCD) have been successfully characterized by using bending beam technique under reliability test. To be more specific, three different types of pressure-sensitive adhesive (hard-, middle-, and soft-type) and various poly(vinyl alcohol) (PVA) stretched directions are devised to examine to key stress contributors and correlations with light leakage. The shrinkage stress in stretched PVA film and stress relaxation ability of pressure-sensitive adhesives (PSA) layers are found to be the key factors determining the stress distribution and out-of-plane displacement of a polarizer stack. For hard-type PSA, its polarizer stack generates the highest bending curvature with maximum out-of-plane displacement but minimum in-plane displacement, leading to anisotropic stress distribution with high stress around the edges. On the other hand, polarizer stack with soft-type PSA yields the maximum in-plane displacement but the minimum out-of-plane displacement, resulting in isotropic stress distribution. (C) 2015 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleStress and stress relaxation behaviors of multi-layered polarizer structures under a reliability test condition characterized by use of a bending beam techniqueen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/JJAP.54.046601en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume54en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000354743200045en_US
dc.citation.woscount0en_US
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