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dc.contributor.authorFan, Ming-Longen_US
dc.contributor.authorHu, Vita Pi-Hoen_US
dc.contributor.authorChen, Yin-Nienen_US
dc.contributor.authorSu, Pinen_US
dc.contributor.authorChuang, Ching-Teen_US
dc.date.accessioned2015-07-21T08:31:16Z-
dc.date.available2015-07-21T08:31:16Z-
dc.date.issued2014-01-01en_US
dc.identifier.isbn978-1-4799-3432-4en_US
dc.identifier.issn0271-4302en_US
dc.identifier.urihttp://hdl.handle.net/11536/124901-
dc.description.abstractIn this work, we comprehensively investigate the impact of interlayer coupling on monolithic 3D logic circuits and 6T SRAM cells using TCAD mixed-mode simulations. In addition to reduced interconnection length, monolithic 3D integration enables further performance enhancements with optimal layout. Our study indicates that minimum leakage, equivalent to the planar 2D circuits with dual reverse body biases, is achievable for circuits stacked in 3D fashion. Moreover, stacking NFET layer over the PFET tier facilitates larger design margins for SRAM cell stability and performance.en_US
dc.language.isoen_USen_US
dc.titleInvestigation and Optimization of Monolithic 3D Logic Circuits and SRAM Cells Considering Interlayer Couplingen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS (ISCAS)en_US
dc.citation.spage1130en_US
dc.citation.epage1133en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000346488600287en_US
dc.citation.woscount0en_US
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