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dc.contributor.authorLyu, Rong-Jheen_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorWu, Ming-Hungen_US
dc.contributor.authorShie, Bo-Shiuanen_US
dc.contributor.authorHung, Hsiang-Tingen_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.date.accessioned2015-07-21T08:31:07Z-
dc.date.available2015-07-21T08:31:07Z-
dc.date.issued2013-01-01en_US
dc.identifier.isbn978-1-4799-2306-9en_US
dc.identifier.issnen_US
dc.identifier.urihttp://hdl.handle.net/11536/124958-
dc.description.abstractA film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.en_US
dc.language.isoen_USen_US
dc.titleFilm Profile Engineering (FPE): A New Concept for Manufacturing of Short-Channel Metal Oxide TFTsen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000346509500070en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper


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