Film Profile Engineering (FPE): A New Concept for Manufacturing of Short-Channel Metal Oxide TFTs

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Lyu, Rong-Jhe	en_US
dc.contributor.author	Lin, Horng-Chih	en_US
dc.contributor.author	Wu, Ming-Hung	en_US
dc.contributor.author	Shie, Bo-Shiuan	en_US
dc.contributor.author	Hung, Hsiang-Ting	en_US
dc.contributor.author	Huang, Tiao-Yuan	en_US
dc.date.accessioned	2015-07-21T08:31:07Z	-
dc.date.available	2015-07-21T08:31:07Z	-
dc.date.issued	2013-01-01	en_US
dc.identifier.isbn	978-1-4799-2306-9	en_US
dc.identifier.issn		en_US
dc.identifier.uri	http://hdl.handle.net/11536/124958	-
dc.description.abstract	A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.	en_US
dc.language.iso	en_US	en_US
dc.title	Film Profile Engineering (FPE): A New Concept for Manufacturing of Short-Channel Metal Oxide TFTs	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)	en_US
dc.contributor.department	電機工程學系	zh_TW
dc.contributor.department	Department of Electrical and Computer Engineering	en_US
dc.identifier.wosnumber	WOS:000346509500070	en_US
dc.citation.woscount	0	en_US
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