完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChou, Shin-Binen_US
dc.contributor.authorTsai, Bi-Hueien_US
dc.date.accessioned2015-07-21T08:31:18Z-
dc.date.available2015-07-21T08:31:18Z-
dc.date.issued2014-01-01en_US
dc.identifier.isbn978-1-890843-29-8en_US
dc.identifier.issn2159-5100en_US
dc.identifier.urihttp://hdl.handle.net/11536/125155-
dc.description.abstractThis paper focuses on the Taiwan integrated circuit (IC) industry because the global market shares of Taiwan IC manufacturing industries are ranked number one. The purposes of study are to compare the differences in the effect of innovation activities on the market value among the IC design, manufacturing, packaging and testing industries and to evaluate whether the tax shields can increase firm value. The results statistically indicate that R&D significantly enhance market values in IC design firms, while does not in IC manufacturing firms, indicating IC firm\'s R&D has a significant impact on the market value in IC design firms. In addition, this investigation concludes that the coefficient of tax shield is insignificant. Finally, the coefficient of book value (equity) in the regression equation is larger than one. The results are consistent with the conservatism principle in the accounting field. Furthermore, we find that the marginal impact of R&D on market values in IC design industries is larger than those in IC manufacturing industries. Under the vertical disintegration structure of Taiwan IC industry, each step of IC manufacturing, packaging and testing stages is fixed with standardized machinery and equipments, so these IC manufacturing stages do not rely on R&D as much as IC design stage does.en_US
dc.language.isoen_USen_US
dc.titleApplication of Vertical Disintegration Theory in R&D Effect on Firm Value in Semiconductor Industryen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 PORTLAND INTERNATIONAL CONFERENCE ON MANAGEMENT OF ENGINEERING & TECHNOLOGY (PICMET)en_US
dc.citation.spage3635en_US
dc.citation.epage3639en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000353636303084en_US
dc.citation.woscount0en_US
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