標題: In Situ Growth of Si Nanowires Using Transmission Electron Microscopy
作者: Chou, Y. -C.
Wen, C. -Y.
Reuter, M. C.
Su, D.
Stach, E. A.
Ross, F. M.
電機學院
College of Electrical and Computer Engineering
公開日期: 1-一月-2013
摘要: We discuss the use of the alloy catalyst AgAu to grow silicon nanowires and Si/Ge heterojunctions. Nanoscale particles of the catalyst with compositions Ag:Au varying from 2:1 to 1:2 can be fabricated and used to form Si nanowires with high crystal quality, and SiGe interfaces that are close to atomically abrupt. In situ experiments in the TEM are essential for investigating the mechanisms of growth with these alloy catalysts. We describe the relationship between growth kinetics and catalyst state, as well as the environmental stability of the alloy catalysts.
URI: http://dx.doi.org/10.1149/05808.0105ecst
http://hdl.handle.net/11536/125174
ISBN: 978-1-60768-453-4; 978-1-62332-099-7
ISSN: 1938-5862
DOI: 10.1149/05808.0105ecst
期刊: STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS) 55 -AND- LOW-DIMENSIONAL NANOSCALE ELECTRONIC AND PHOTONIC DEVICES 6
Volume: 58
起始頁: 105
結束頁: 111
顯示於類別:會議論文