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dc.contributor.authorWu, CLen_US
dc.contributor.authorChang, Len_US
dc.contributor.authorChen, HGen_US
dc.contributor.authorLin, CWen_US
dc.contributor.authorChang, TFen_US
dc.contributor.authorChao, YCen_US
dc.contributor.authorYan, JKen_US
dc.date.accessioned2014-12-08T15:17:11Z-
dc.date.available2014-12-08T15:17:11Z-
dc.date.issued2006-03-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2005.07.096en_US
dc.identifier.urihttp://hdl.handle.net/11536/12536-
dc.description.abstractZnO nanorods were grown on Si substrates by metal-organic chemical vapor deposition (CVD). The ZnO nanorods were characterized by scanning electron microscopy, transmission electron microscopy (TEM), and X-ray diffraction. It was found that highly oriented ZnO single-crystalline nanorods were formed only on the substrate coated with a gold film. Without the gold, ZnO was deposited as a continuous film. No Au was observed on top of the ZnO nanorods, implying that the Au plays no role as catalytic metal in vapor-liquid-solid mechanism for formation of ZnO nanorods. In CVD, oriented ZnO nanorods along the c-axis were grown as a result of < 111 > textured Au. High-resolution TEM shows that the gold layer and ZnO are in orientation relationship of Au 111 planes//ZnO (0002) basal planes. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectchemical vapor depositionen_US
dc.subjectzinc oxideen_US
dc.subjectnanoroden_US
dc.subjectgolden_US
dc.titleGrowth and characterization of chemical-vapor-deposited zinc oxide nanorodsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.tsf.2005.07.096en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume498en_US
dc.citation.issue1-2en_US
dc.citation.spage137en_US
dc.citation.epage141en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000235270500027-
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