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dc.contributor.authorHsu, MYen_US
dc.contributor.authorTang, SFen_US
dc.contributor.authorChiang, CDen_US
dc.contributor.authorSu, CCen_US
dc.contributor.authorWang, LCen_US
dc.contributor.authorKuo, CTen_US
dc.date.accessioned2014-12-08T15:17:18Z-
dc.date.available2014-12-08T15:17:18Z-
dc.date.issued2006-03-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2005.07.078en_US
dc.identifier.urihttp://hdl.handle.net/11536/12583-
dc.description.abstractThe InAs quantum dot (QD) structures grown on (100) 2 degrees, 6 degrees, 10 degrees, 15 degrees off-angles to (111)A GaAs substrate have been investigated by atomic force microscopy (AFM) and cryogenic photoluminescence (PL). The exact-angle InAs/GaAs is used as the reference sample. The blue shift of PL peak spectra with increasing misoriented scales has also been observed experimentally. In this work, we demonstrated that different off-angle substrates would influence the distribution and uniformity of QD due to variant surface potential energies, which are responsible for the two-stage process (migration and nucleation) of InAs adatoms on the off-angle substrates. (c) 2005 Elsevier B.V All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectmetal-organic chemical vapour deposition (MOCVD)en_US
dc.subjectPLen_US
dc.subjectAFMen_US
dc.subjectquantum dot infrared photodetector (QDIP)en_US
dc.titleOptical recombination-emission characteristics and surface morphologies of InAs quantum dots grown on misoriented GaAs substrate by MOCVDen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.tsf.2005.07.078en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume498en_US
dc.citation.issue1-2en_US
dc.citation.spage183en_US
dc.citation.epage187en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000235270500036-
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