標題: Optical and mechanical property changes in thin-film filters with post deposition thermal treatments
作者: Wei, CT
Shieh, HPD
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
關鍵字: DWDM filters;dichroic mirror;reactive electron-beam deposition;compression stress;ion-assisted deposition
公開日期: 1-三月-2006
摘要: In this paper, we report the effects of two types of filter with post deposition thermal treatments: one effect is the central wavelength of thin-film narrow-band-pass filters increasing with increasing post-deposition annealing temperature above 250 degrees C, which is a permanent bake-shift effect. It therefore appears possible to "tune" the stress of narrow-band-pass filters by this post-deposition annealing to shift center wavelength. The other effect is the position of T-50% wavelength of a dichroic mirror shifting with increasing Substrate temperature, which is the condition under which that dichroic mirror operates inside a projector. A dichroic mirror was deposited oil different types Substrate for comparison of the amplitude of T-50% wavelength shift. We can predict the shifts in wavelength and choose the most appropriate substrate material for a dichroic mirror to obtain a T-50% wavelength change minimum, i.e., to avoid it color change of the projection image. Mechanical properties Such as stresses in Ta2O5, TiO2, Nb2O5, and SiO2 single layer films fabricated by different deposition processes are investigated in this study.
URI: http://dx.doi.org/10.1143/JJAP.45.1783
http://hdl.handle.net/11536/12594
ISSN: 0021-4922
DOI: 10.1143/JJAP.45.1783
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 45
Issue: 3A
起始頁: 1783
結束頁: 1787
顯示於類別:期刊論文


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