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dc.contributor.authorWei, CTen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:17:19Z-
dc.date.available2014-12-08T15:17:19Z-
dc.date.issued2006-03-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.1783en_US
dc.identifier.urihttp://hdl.handle.net/11536/12594-
dc.description.abstractIn this paper, we report the effects of two types of filter with post deposition thermal treatments: one effect is the central wavelength of thin-film narrow-band-pass filters increasing with increasing post-deposition annealing temperature above 250 degrees C, which is a permanent bake-shift effect. It therefore appears possible to "tune" the stress of narrow-band-pass filters by this post-deposition annealing to shift center wavelength. The other effect is the position of T-50% wavelength of a dichroic mirror shifting with increasing Substrate temperature, which is the condition under which that dichroic mirror operates inside a projector. A dichroic mirror was deposited oil different types Substrate for comparison of the amplitude of T-50% wavelength shift. We can predict the shifts in wavelength and choose the most appropriate substrate material for a dichroic mirror to obtain a T-50% wavelength change minimum, i.e., to avoid it color change of the projection image. Mechanical properties Such as stresses in Ta2O5, TiO2, Nb2O5, and SiO2 single layer films fabricated by different deposition processes are investigated in this study.en_US
dc.language.isoen_USen_US
dc.subjectDWDM filtersen_US
dc.subjectdichroic mirroren_US
dc.subjectreactive electron-beam depositionen_US
dc.subjectcompression stressen_US
dc.subjection-assisted depositionen_US
dc.titleOptical and mechanical property changes in thin-film filters with post deposition thermal treatmentsen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.1783en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue3Aen_US
dc.citation.spage1783en_US
dc.citation.epage1787en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000236191900064-
dc.citation.woscount3-
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