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dc.contributor.authorFeng, ZCen_US
dc.contributor.authorChen, CFen_US
dc.contributor.authorKuo, CTen_US
dc.contributor.authorWilliams, Ken_US
dc.contributor.authorShan, Wen_US
dc.date.accessioned2014-12-08T15:17:21Z-
dc.date.available2014-12-08T15:17:21Z-
dc.date.issued2006-02-24en_US
dc.identifier.issn0257-8972en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.surfcoat.2005.07.005en_US
dc.identifier.urihttp://hdl.handle.net/11536/12607-
dc.language.isoen_USen_US
dc.titleThe 3rd Asian Conference on Chemical Vapor Deposition (3rd Asian-CVD), Taipei, Taiwan, November 12-14, 2004 - Prefaceen_US
dc.typeEditorial Materialen_US
dc.identifier.doi10.1016/j.surfcoat.2005.07.005en_US
dc.identifier.journalSURFACE & COATINGS TECHNOLOGYen_US
dc.citation.volume200en_US
dc.citation.issue10en_US
dc.citation.spage3103en_US
dc.citation.epage3103en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000235270500001-
dc.citation.woscount0-
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