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dc.contributor.authorKang, YHen_US
dc.contributor.authorDen, Wen_US
dc.contributor.authorBai, HLen_US
dc.date.accessioned2014-12-08T15:17:22Z-
dc.date.available2014-12-08T15:17:22Z-
dc.date.issued2006-02-15en_US
dc.identifier.issn0888-5885en_US
dc.identifier.urihttp://dx.doi.org/10.1021/ie050754sen_US
dc.identifier.urihttp://hdl.handle.net/11536/12622-
dc.description.abstractShort time adsorption and desorption behaviors of two alkyl phthalate esters, namely diethyl phthalate (DEP) and dibutyl phthalate (DBP), on silicon wafers exposed under various ambient concentrations were experimentally and theoretically investigated. The results showed that the surface density of DBP was significantly affected by both the length of exposure time and its ambient concentration, whereas that of DEP was only affected by its ambient concentration within the tested periods between 60 and 240 min. The determination of rate parameters for adsorption and desorption showed that the rate constants of DEP were always larger than those of DBP. Also, the sticking coefficient of DEP was larger during the initial adsorption stage due to its relatively lower molecular weight as compared to DBP. The value of the sticking coefficient for DEP, however, decreased much faster such that the value eventually became smaller than that for DBP. Therefore, for silicon wafers experiencing a short exposure time, organic compounds with lower molecular weights may be a more important source of airborne molecular contamination than those with higher molecular weights.en_US
dc.language.isoen_USen_US
dc.titleShort time deposition kinetics of diethyl phthalate and dibutyl phthalate on a silicon wafer surfaceen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/ie050754sen_US
dc.identifier.journalINDUSTRIAL & ENGINEERING CHEMISTRY RESEARCHen_US
dc.citation.volume45en_US
dc.citation.issue4en_US
dc.citation.spage1331en_US
dc.citation.epage1336en_US
dc.contributor.department環境工程研究所zh_TW
dc.contributor.departmentInstitute of Environmental Engineeringen_US
dc.identifier.wosnumberWOS:000235294400011-
dc.citation.woscount14-
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