完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 洪宜諼 | en_US |
dc.contributor.author | Hung, Yi-Syuan | en_US |
dc.contributor.author | 施敏 | en_US |
dc.contributor.author | 張鼎張 | en_US |
dc.contributor.author | Sze,Simon | en_US |
dc.contributor.author | Chang, Ting-Chang | en_US |
dc.date.accessioned | 2015-11-26T00:56:41Z | - |
dc.date.available | 2015-11-26T00:56:41Z | - |
dc.date.issued | 2015 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#GT070250110 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/126622 | - |
dc.language.iso | zh_TW | en_US |
dc.subject | 銦鎵鋅氧薄膜電晶體 | zh_TW |
dc.subject | 閘極電應力 | zh_TW |
dc.subject | 可靠度 | zh_TW |
dc.subject | 焦耳熱 | zh_TW |
dc.subject | 自我加熱效應 | zh_TW |
dc.subject | InGaZnO | en_US |
dc.subject | thin film transistors | en_US |
dc.subject | gate bias stress | en_US |
dc.subject | Joule-heating | en_US |
dc.subject | self-heating effect | en_US |
dc.title | 前瞻銦鎵鋅氧薄膜電晶體之閘極電應力與自我加熱效應可靠度分析 | zh_TW |
dc.title | Investigation on Reliability of Advanced a-InGaZnO Thin Film Transistors under Gate Bias Stress and Self-Heating Effect | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 電子工程學系 電子研究所 | zh_TW |
顯示於類別: | 畢業論文 |