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dc.contributor.author洪宜諼en_US
dc.contributor.authorHung, Yi-Syuanen_US
dc.contributor.author施敏en_US
dc.contributor.author張鼎張en_US
dc.contributor.authorSze,Simonen_US
dc.contributor.authorChang, Ting-Changen_US
dc.date.accessioned2015-11-26T00:56:41Z-
dc.date.available2015-11-26T00:56:41Z-
dc.date.issued2015en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT070250110en_US
dc.identifier.urihttp://hdl.handle.net/11536/126622-
dc.language.isozh_TWen_US
dc.subject銦鎵鋅氧薄膜電晶體zh_TW
dc.subject閘極電應力zh_TW
dc.subject可靠度zh_TW
dc.subject焦耳熱zh_TW
dc.subject自我加熱效應zh_TW
dc.subjectInGaZnOen_US
dc.subjectthin film transistorsen_US
dc.subjectgate bias stressen_US
dc.subjectJoule-heatingen_US
dc.subjectself-heating effecten_US
dc.title前瞻銦鎵鋅氧薄膜電晶體之閘極電應力與自我加熱效應可靠度分析zh_TW
dc.titleInvestigation on Reliability of Advanced a-InGaZnO Thin Film Transistors under Gate Bias Stress and Self-Heating Effecten_US
dc.typeThesisen_US
dc.contributor.department電子工程學系 電子研究所zh_TW
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